Photolithography is considered as the bottleneck in semiconductor manufacturing, and a good control of critical dimension, alignment accuracy and photoresist thickness is essential for maintaining a high quality level of wafers. In this study, a photolith Photolithography is considered as the bottleneck in semiconductor manufacturing, and a good control of critical dimension, alignment accuracy and photoresist thickness is essential for maintaining a high quality level of wafers. In this study, a photolith
