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    請使用永久網址來引用或連結此文件: http://chur.chu.edu.tw/handle/987654321/34575


    題名: Advanced Process Control of Metal Sputter Deposition Using a Time Series Analysis
    作者: 陳俊宏
    Chen, Juhn-Horng
    貢獻者: 機械工程學系
    Mechanical Engineering
    關鍵詞: time series model;deposition rate;d-EWMA controller
    time series model;deposition rate;d-EWMA controller
    日期: 2008
    上傳時間: 2014-06-27 02:55:31 (UTC+8)
    摘要: By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim
    By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim
    顯示於類別:[機械工程學系] 期刊論文

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