Advanced Process Control of Metal Sputter Deposition Using a Time Series Analysis

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题名:	Advanced Process Control of Metal Sputter Deposition Using a Time Series Analysis
作者:	陳俊宏 Chen, Juhn-Horng
贡献者:	機械工程學系 Mechanical Engineering
关键词:	time series model;deposition rate;d-EWMA controller time series model;deposition rate;d-EWMA controller
日期:	2008
上传时间:	2014-06-27 02:55:31 (UTC+8)
摘要:	By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim
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