Advanced Process Control of Metal Sputter Deposition Using a Time Series Analysis

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Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/34575

Title:	Advanced Process Control of Metal Sputter Deposition Using a Time Series Analysis
Authors:	陳俊宏 Chen, Juhn-Horng
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	time series model;deposition rate;d-EWMA controller time series model;deposition rate;d-EWMA controller
Date:	2008
Issue Date:	2014-06-27 02:55:31 (UTC+8)
Abstract:	By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim By the time series model, this paper constncted the disturbance model for the aluminum sputter deposition process, and derived the Autoregressive integrated Moving Average and Least-Square (ARIMA-LS) controller based on this new disturbance model. Experim
Appears in Collections:	[Department of Mechanical Engineering] Journal Articles

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