Nitrogen Depletion Behavior of High-Nitrogen Oxynitride Films After Reoxidation with O2 and N2O treatment

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Title:	Nitrogen Depletion Behavior of High-Nitrogen Oxynitride Films After Reoxidation with O2 and N2O treatment
Authors:	賴瓊惠 Lai, Chiung-Hui
Contributors:	電子工程學系 Electronics Engineering
Keywords:	含氮氧化層;快速熱氧化;氮空乏;再氧化 oxynitride;rapid thermal oxidation;nitrogen depletion;nitrous oxide;reoxidation
Date:	2009
Issue Date:	2014-07-01 10:30:27 (UTC+8)
Abstract:	探討高含氮含氮氧化層在O2或和N2O的再氧化處理之後的氮空乏行為 We investigated the nitrogen depletion behavior of high nitrogen oxynitride after O2 or N2O reoxidation in a rapid thermal furnace. We observed that the nitrogen concentration decreased in both cases, and the nitrogen distribution moved toward the SiO2/Si
Appears in Collections:	[Department of Microelectronics] Journal Articles

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