Comparison of Characteristics of Rapid Thermal and Microwave
Annealed Amorphous Silicon Thin Films Prepared by Electron Beam Evaporation and Low Pressure Chemical Vapor Deposition

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题名:	Comparison of Characteristics of Rapid Thermal and Microwave Annealed Amorphous Silicon Thin Films Prepared by Electron Beam Evaporation and Low Pressure Chemical Vapor Deposition
作者:	賴瓊惠 Lai, Chiung-Hui
贡献者:	電子工程學系 Electronics Engineering
关键词:	E-beam evaporation;low pressure chemical vapor deposition;amorphous silicon thin
日期:	2013
上传时间:	2014-07-01 10:29:04 (UTC+8)
摘要:	In this study we use chemical and physical vapor depositions to fabricate amorphous silicon (a-Si) films. We also use traditional rapid thermal annealing (RTA) and advanced microwave annealing (MWA) to activate or crystallize a-Si films and then observe t
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