Chung-Hua University Repository:Item 987654321/36355
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    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/36355


    Title: The implementation of neural network for semiconductor PECVD process
    Authors: 鄧維兆
    Deng, Wei-Jaw
    Contributors: 餐旅管理學系
    Hospitality Management
    Keywords: Quality predictor;Plasma-enhanced chemical vapor deposition;PECVD;Back-propagation neural network;Taguchi method;Silicon dioxide films
    Date: 2007
    Issue Date: 2014-06-27 15:02:52 (UTC+8)
    Abstract: In semiconductor manufacturing, the monitoring system has been developed very excellently and can be used for comprehensively
    collecting the historical data of process information and quality characteristics of equipment. However, due to the high turnover
    Appears in Collections:[Department of Hospitality Management] Journal Articles

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