Appication of advanced process control on mixed-product chemical mechanical polishing process

Chung-Hua University Repository > 工學院 > 機械工程學系 > 研討會論文 > Item 987654321/35004

請使用永久網址來引用或連結此文件: http://chur.chu.edu.tw/handle/987654321/35004

題名:	Appication of advanced process control on mixed-product chemical mechanical polishing process
作者:	陳俊宏 Chen, Juhn-Horng
貢獻者:	機械工程學系 Mechanical Engineering
關鍵詞:	mix-product;chemical mechanical polishing;analysis of variance;time series analysis;extended Kalman filter
日期:	2011
上傳時間:	2014-06-27 03:17:04 (UTC+8)
摘要:	This research developed a run-to-run (RtR) process control technique on the mix-product chemical mechanical polishing (CMP) process. The model of the mix-product CMP process was constructed by using analysis of variance and time series analysis. Then, it
顯示於類別:	[機械工程學系] 研討會論文

文件中的檔案:

檔案	描述	大小	格式	瀏覽次數
s_M211_0432.pdf		27Kb	Adobe PDF	228	檢視/開啟

在CHUR中所有的資料項目都受到原著作權保護.