Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter

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Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/34666

Title:	Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter
Authors:	陳俊宏 Chen, Juhn-Horng
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
Date:	2007
Issue Date:	2014-06-27 02:59:29 (UTC+8)
Abstract:	By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
Appears in Collections:	[機械工程學系] 期刊論文

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