High-k TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment

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Title:	High-k TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
Authors:	謝英家 Hsieh, Ing-Jar
Contributors:	電機工程學系 Electrical Engineering
Keywords:	MIM Capacitor
Date:	2010
Issue Date:	2014-06-27 02:40:18 (UTC+8)
Abstract:	In this study, we successfully fabricated high-k Ir/TiCeO/TaN metal–insulator–metal (MIM) capacitors using a dual-plasma treatment on a bottom TaN electrode. The plasma treatment suppressed the growth of the bottom interfacial layer to largely improve cap
Appears in Collections:	[Department of Electrical Engineering] Journal Articles

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