Chung-Hua University Repository:Item 987654321/34106
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    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/34106


    Title: Formation of Iridium Nanocrystals with Highly Thermal Stability for the Applications of Nonvolatile Memory Device with Excellent Trapping Ability
    Authors: 謝英家
    Hsieh, Ing-Jar
    Contributors: 電機工程學系
    Electrical Engineering
    Keywords: nanocrystals
    Date: 2010
    Issue Date: 2014-06-27 02:39:42 (UTC+8)
    Abstract: This paper presents the formation of iridium nanocrystals (Ir-NCs) embedded in SiO2 matrix and it can be used for potential applications of nonvolatile memory devices. The NC formation is investigated by varying Ir film thickness; and the thermal agglomera
    Appears in Collections:[Department of Electrical Engineering] Journal Articles

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