The High-Speed Measurement of a Partial Area Imaging System Applied to Photoresist Development Processing

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Title:	The High-Speed Measurement of a Partial Area Imaging System Applied to Photoresist Development Processing
Authors:	邱奕契 Chiou, Yih-Chih
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	Photolithography;exposure and development time;high speed image inspection system Photolithography;exposure and development time;high speed image inspection system
Date:	2005
Issue Date:	2014-06-27 02:37:09 (UTC+8)
Abstract:	Among the parameters that affect photolithography,the most important are exposure and development time which affect the coating photoresist characteristics.This study further researches the relationship between the exposure and development time using a hi Among the parameters that affect photolithography,the most important are exposure and development time which affect the coating photoresist characteristics.This study further researches the relationship between the exposure and development time using a hi
Appears in Collections:	[Department of Mechanical Engineering] Journal Articles

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