Chung-Hua University Repository:Item 987654321/33848
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    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/33848


    Title: Confined Resistive Switching of TiO2 Dielectrics Resistive Random Access Memory with a nanopore in the TiO2 film created by Focus Ion Beam
    Authors: 吳建宏
    rossiwu
    Contributors: 電子工程學系
    Electronics Engineering
    Keywords: TiO2;high-k material;RRAM;Focus Ion Beam
    Date: 2012
    Issue Date: 2014-06-27 02:31:43 (UTC+8)
    Abstract: TiO2 high-k material has attracted much attention recently because of its reversible resistance switching behavior for resistive random access memory (RRAM) devices. Essentially, low cost, low power, multi-level cell and reliability close to flash are req
    Appears in Collections:[Department of Microelectronics] Seminar Papers

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