Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor

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Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/33706

Title:	Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor
Authors:	鄭藏勝 Cheng, T. S.
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	A1;Computer simulation;A1;Convection;A1;Fluid flow;A3;MOCVD
Date:	2006
Issue Date:	2014-06-27 02:28:43 (UTC+8)
Abstract:	A detailed computational study is carried out to investigate the effects of Grashof (Gr) and Reynolds (Re) numbers on the three-dimensional (3-D) flow structures and heat transfer characteristics in a horizontal chemical vapor deposition (CVD) reactor wit
Appears in Collections:	[Department of Mechanical Engineering] Journal Articles

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