PECVD Silicon Intrinsic Layer Deposition on Glass Substrate for
Solar Cell Design

CHUR > College of Engineering > Department of Communication Engineering > Seminar papers > Item 987654321/32813

Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/32813

Title:	PECVD Silicon Intrinsic Layer Deposition on Glass Substrate for Solar Cell Design
Authors:	林君明 Lin, Jium-Ming
Contributors:	通訊工程學系 Communication Engineering
Keywords:	PECVD PECVD
Date:	2010
Issue Date:	2014-06-27 02:05:37 (UTC+8)
Abstract:	This research is to deposit silicon thin film as the intrinsic layer of solar cell by PECVD on glass substrate with transparent conductive layer for solar cell intrinsic layer design. The method is to deposit transparent conductive layer ZnO and silver el This research is to deposit silicon thin film as the intrinsic layer of solar cell by PECVD on glass substrate with transparent conductive layer for solar cell intrinsic layer design. The method is to deposit transparent conductive layer ZnO and silver el
Appears in Collections:	[Department of Communication Engineering] Seminar papers

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